/solarbytes/media/media_files/2025/04/24/875Bajh1FxlOgyxLNXi3.jpg)
The optimized ICO layer in SHJ cells raised current density by 0.67 and improved efficiency by 0.55%, reaching 23.6%. Image Source: Science Direct. Image Source: ARS
Researchers from Delft University and NOVA University Lisbon published a study on optimizing room-temperature RF-sputtered cerium-doped indium oxide (ICO) for use in high-performance SHJ solar cells. They adjusted sputtering parameters such as oxygen flow, deposition pressure and RF power. The optimized 35 nm ICO layer showed a mobility of 44.22 cm²/Vs, a carrier concentration of 1.65 × 10²⁰/cm³, and a resistivity of 8.56 × 10⁻⁴ Ω·cm. When applied to front/back contact silicon heterojunction (FBC-SHJ) solar cells, the ICO layer raised the short-circuit current density by 0.67 compared to ITO-based cells. This led to a 0.55% increase in power conversion efficiency, reaching around 23.6%.